COMPARATIVE X-RAY DIFFRACTOMETRY OF THE DEFECT STRUCTURE OF ZnO EPITAXIAL FILMS DEPOSITED BY MAGNETRON SPUTTERING ON C-PLANE Al2O3 SUBSTRATES IN INHOMOGENEOUS ELECTRIC FIELD
- Authors: Volkovsky Y.A.1, Zhernova V.A.1, Folomeshkin M.S.2,3, Prosekov P.A.1, Muslimov A.E.1, Butashin A.V.1, Ismailov A.M.4, Grigoriev Y.V.1, Pisarevsky Y.V.1, Kanevsky V.M.1,5
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Affiliations:
- Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics,”Russian Academy of Sciences, Moscow, 119333 Russia
- National Research Centre “Kurchatov Institute”, 123182, Moscow, Russia
- Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics,” Russian Academy of Sciences, 119333, Moscow, Russia
- Dagestan State University, Makhachkala, Republic of Dagestan, 36700 Russia
- National Research Centre “Kurchatov Institute,” Moscow, 123182 Russia
- Issue: Vol 68, No 2 (2023)
- Pages: 180-188
- Section: ДИФРАКЦИЯ И РАССЕЯНИЕ ИОНИЗИРУЮЩИХ ИЗЛУЧЕНИЙ
- URL: https://rjmseer.com/0023-4761/article/view/673480
- DOI: https://doi.org/10.31857/S0023476123020212
- EDN: https://elibrary.ru/BTJWEV
- ID: 673480
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