Effect of О2+ Ion Implantation on the Elemental and Chemical Composition of the Si(111) Surface
- Authors: Allayarova G.K.1, Umirzakov B.E.2, Tashatov A.K.1
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Affiliations:
- Karshi State University
- Таshkent State Technical University
- Issue: No 5 (2024)
- Pages: 78-81
- Section: Articles
- URL: https://rjmseer.com/1028-0960/article/view/664645
- DOI: https://doi.org/10.31857/S1028096024050117
- EDN: https://elibrary.ru/FTPIKG
- ID: 664645
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