Investigation of high-intensity implantation of titanium ions into silicon under conditions of the beam’s energy impact on the surface
- 作者: Ivanova А.I.1, Vakhrushev D.О.1, Korneva О.S.1, Gurulev А.V.1, Varlachev V.А.1, Efimov D.D.2, Chernyshev А.А.3
-
隶属关系:
- National Research Tomsk Polytechnic University
- Immanuel Kant Baltic Federal University
- National Research Tomsk State University
- 期: 编号 10 (2024)
- 页面: 74-79
- 栏目: Articles
- URL: https://rjmseer.com/1028-0960/article/view/664735
- DOI: https://doi.org/10.31857/S1028096024100095
- EDN: https://elibrary.ru/SHEYEO
- ID: 664735
如何引用文章