The Effect of Thermal Action on the Change in the Chemical Composition of the Surface Layers of a Titanium Alloy, with a Sprayed Carbon Film, after Irradiation with N+ Ions

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Abstract

The effect of thermal exposure under high vacuum conditions on the chemical composition of the surface layers of the VT6 alloy with mixed implantation of N+ ions by a carbon film is investigated. It is shown that under the conditions of thermal exposure, the change in the concentration profiles of the distribution of elements is determined by the processes of chemical interaction, in which the diffusion of carbon and nitrogen into deeper layers does not occur. On the contrary, their concentration decreases and this is due to the formation of volatile compounds CO, CO2 or (CH)2 under thermal exposure. Titanium in the surface analyzed layer is in an oxidized state with various degrees of oxidation. Up to a depth of about 10 nm, the oxidation state of titanium is Ti4+ and Ti3+, and in the transition region of the film/substrate is Ti2+.

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About the authors

V. L. Vorobyov

1Udmurt Federal Research Center UB RAS

Author for correspondence.
Email: Vasily_L.84@udman.ru
Russian Federation, Izhevsk

P. V. Bykov

Udmurt Federal Research Center UB RAS

Email: bykovpv@udman.ru
Russian Federation, Izhevsk

F. Z. Gilmutdinov

Udmurt Federal Research Center UB RAS

Email: Vasily_L.84@udman.ru
Russian Federation, Izhevsk

V. Ya. Bayankin

Udmurt Federal Research Center UB RAS

Email: Vasily_L.84@udman.ru
Russian Federation, Izhevsk

I. G. Pospelova

Udmurt State Agricultural University

Email: Vasily_L.84@udman.ru
Russian Federation, Izhevsk

V. F. Kobziev

Udmurt State University

Email: Vasily_L.84@udman.ru
Russian Federation, Izhevsk

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Supplementary files

Supplementary Files
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2. Fig. 1. Element distribution profiles in the near-surface layers of samples with the initial sputtered film (a), after its ion-beam stirring (b) and after thermal treatment with stirred carbon film (c) with N+ ion implantation

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3. Fig. 2. XRD spectra of C1s sample after stirring and thermal treatment from depths of 5 (a) and 20 (b) nm

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4. Fig. 3. XRD spectra of N1s sample after stirring and thermal treatment from depths of 1 (a) and 40 (b) nm

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5. Fig. 4. Distribution profiles of titanium and carbon after ion-beam mixing (1 - Ti, 2 - C) and after thermal treatment (3 - Ti, 4 - C)

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6. Fig. 5. Nitrogen distribution profiles after ion-beam mixing (1) and after thermal treatment (2)

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7. Fig. 6. Oxygen distribution profiles after ion-beam stirring (1), after thermal exposure of the sample with stirred carbon film (2)

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8. Fig. 7. XRD spectra of Ti2p from near-surface layers of the sample after stirring and heat treatment

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